ROSIE

Insider Brief

  • RIBER has secured a new order from a US-based quantum computing company for its ROSIE molecular beam epitaxy system, marking a milestone in its commercialization.
  • ROSIE, compatible with 300 mm silicon wafers, is designed for thin oxide layer growth such as barium titanate, a material critical for integrated electro-optic modulators in silicon photonics.
  • The system, scheduled for delivery in 2026 ahead of full industrialization in 2027, reinforces RIBER’s strategic position in emerging quantum and semiconductor markets.

PRESS RELEASE — RIBER, a global market leader in molecular beam epitaxy (MBE) equipment for the semiconductor industry, announces a new order for a ROSIE system from a new US-based customer specialized in quantum computing.

This order represents a key milestone in the development of ROSIE, RIBER’s latest innovation. Fully automated and compatible with 300 mm silicon wafers, ROSIE is designed for the growth of thin oxide layers, particularly barium titanate (BTO), a strategic material for the development of integrated electro-optic modulators.

Following the collaboration announced last June with the Novo Nordisk Foundation Quantum Computing Programme (NQCP) in Denmark, this new order from a cutting-edge quantum computing technology player in the United States demonstrates both the technological credibility of ROSIE and the confidence in RIBER’s solutions.

While ROSIE’s commercial industrialization is scheduled for 2027, this new order, fully aligned with RIBER’s strategic roadmap, already highlights the growing momentum in silicon photonics solutions, a critical enabler for the development of quantum technologies.

RIBER is strengthening its position at the forefront of integrated silicon photonics and confirming its ability to address the emerging needs of the next-generation semiconductor industry.

The system is scheduled for delivery in 2026.


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